GERMANIUM SECRETS

Germanium Secrets

≤ 0.fifteen) is epitaxially developed with a SOI substrate. A thinner layer of Si is developed on this SiGe layer, and afterwards the structure is cycled through oxidizing and annealing stages. Due to preferential oxidation of Si over Ge [sixty eight], the first Si1–Germanium Micron Powderis also Employed in the manufacture of fluorescent lamps

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